Outline of pulse plating.

Application of Pulse Plating - Amorphous Alloys

Amorphous alloys can be electrodeposited by direct or pulsed current. According to electrocrystallization theory, a high crystallization overpotential produces microcrystalline structure in the deposits. Thus if the amorphous phase consists of microcrystals, pulsed current is preferable for preparing amorphous alloys. However, another newly proposed theory holds that the amorphous phase structu...

Pulse and pulse reverse plating—Conceptual, advantages and applications

A review on pulse and pulse reverse techniques for electrodeposition have been attempted. Pulse electrodeposition (PED) of some metals and lloys are reported. The effects of mass, transport, electrical double layer pulse parameters and current distribution on surface roughness and orphology are presented. Applications, advantages and disadvantages of PC and PRC techniques are discussed along wi...

Pulse Reversal PermAlloy Plating Process for MEMS Applications

Pulse reverse plating for uniform nickel height in zone plates

Nickel soft x-ray zone plates are fabricated by through-mask electroplating. The authors report on how a uniform nickel thickness can be obtained over the entire zone plate using pulse and pulse reverse plating. If the plating is carried out at a constant current the nickel thickness has been observed to decrease with radius. This results in lower outer zones and reduced diffraction efficiency ...

Pulse Plating of Soft High Magnetic Moment Materials-Properties and Application

In this paper, we present recent results obtained for pulse plating of 1.8 T CoNiFe alloy. As a starting point, a comprehensive model is developed that explains and mathematically describes the phenomenon of pole tip depression observed in the case of direct current deposition. Based on this model and its results the parameters like pulse time, rest time, and magnitude of the pulse current jpp ...